AMAT 0190-38391 RF Generator

AMAT 0190-38391 RF Generator

 Introduction

AMAT 0190-38391 RF generator, a dedicated RF power supply for semiconductor machines, used to generate plasma for wafer processing.

Product Features

1. Stable RF power output and good process repeatability

2. Fine power regulation, able to flexibly match different processes

3. Equipped with reflection power and overcurrent thermal protection, it is not easy to burn the equipment

4. Fast response speed, quickly stabilizing the plasma when the chamber load changes

5. Strong anti-interference ability, stable operation in complex environments of dust-free workshops

6. Anti seismic and temperature resistant, supporting long-term uninterrupted operation of the machine platform

7. Smooth communication with AMAT host and real-time reporting of operating status

8. Modular design, easy disassembly and replacement, and convenient maintenance

9. Clean RF waveform reduces wafer process defects

10. Durable components with low failure rate during continuous use of the production line

Application Areas

1. Semiconductor wafer etching process

2. Thin film deposition PVD/CVD equipment

3. Plasma surface treatment process

4. Wafer cleaning plasma equipment

5. Application materials supporting process chamber

AMAT 0190-38391 RF generator has stable process performance and reliable protection, making it a critical RF spare part in semiconductor plasma processes

Product imag

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