AE A3L5080BA140D211A RF Generator

AE A3L5080BA140D211A RF Generator 

 Introduction

The AE A3L5080BA140D211A RF generator is a commonly used RF power supply in semiconductor equipment, with stable plasma process output.

Product Features

Stable power output ensures consistency in each batch of processes.

Built in arc protection, quickly cuts off power when the chamber ignites.

Strong load adaptability to cope with fluctuations in cavity state.

Rack mounted installation, easy replacement of spare parts on site.

Comes with status feedback for quick troubleshooting.

Product Specifications

Model A3L5080BA140D211A RF generator.

Suitable for semiconductor plasma process chambers.

Standard 13.56MHz RF operating frequency.

Built in power sampling and reflection monitoring.

Support machine communication to read operational data.

Application Areas

Plasma excitation in semiconductor etching chamber.

PVD thin film deposition with RF power supply.

Replacement of power supply spare parts for old semiconductor machines.

Supporting equipment for cavity plasma cleaning.

Vacuum plasma surface treatment equipment.

This RF generator, when used in conjunction with an RF matching device, is a core power supply spare part in wafer processing equipment

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