Daihen FGA-30G2-V RF Generator

Daihen FGA-30G2-V RF Generator 

 Introduction

Most colleagues who maintain TEL etching machines are familiar with the Daihen FGA-30G2-V RF generator, which is an original Daihen RF power supply specifically designed to generate plasma RF power and is a core power supply spare part in TEL semiconductor etching equipment.

Product Features

1. Stable output power, minimal power fluctuations when plasma load changes, ensuring process consistency

2. Built in multiple protections, overheating, overcurrent, and excessive reflected power will trigger shutdown protection

3. High power conversion efficiency, controllable heating during long-term continuous operation, reducing machine thermal drift

4. Native adaptation to TEL machine communication protocol, ready to use, easy and convenient on-site replacement

5. Compact structure, suitable for narrow installation space inside the machine, easy maintenance and disassembly

Product Specifications

1. Operating frequency 40.68MHz

2. Rated output power 3000W

3. Input three-phase AC200V

4. Support communication between analog and digital IO

5. The cooling method is forced air cooling

Application Areas

1. Dry etching process for semiconductor wafers

2. Plasma thin film processing technology

3. TEL etching cavity RF power supply

4. Plasma cleaning process on wafer surface

5. Repair and replacement of spare parts for TEL equipment RF power supply

Overall, the Daihen FGA-30G2-V RF generator has a stable power output and is suitable for TEL etching equipment. It is often used for repairing and replacing RF power supply failures on production lines.

Product imag

ontroller Module

1C31107G01 Digital output module
1C31147G01 Digital output module
1C31150G01 Digital quantity input module

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