Lam 660-093818-002 RF power supply

Lam 660-093818-002 RF power supply 

 Introduction

Lam 660-093818-002 RF power supply is a dedicated RF generator for etching machines, which is commonly circulated in the semiconductor spare parts market

1. Fast output power response speed, able to quickly match chamber load changes, ensuring stable plasma process

2. Built in arc protection circuit, which immediately suppresses power when ignition occurs in the chamber, protecting the machine and wafer

3. Equipped with a dedicated communication protocol for the machine, it can directly connect to the Lam device control system with strong adaptability

4. Low ripple RF output, reducing process fluctuations and improving wafer processing yield

5. Rack mounted integrated structure, easy disassembly and replacement, short downtime for production line maintenance

1. Model 660-093818-002, Lam factory matching RF power supply

2. Rated output power 2500W

3. RF operating frequency 13.56MHz

4. Standard 50 Ω output impedance

5. Support both local panel and remote power regulation

This RF power supply is commonly used in semiconductor plasma etching related processes

1. Lam series wafer etching machine RF power supply

2. Plasma surface treatment process for silicon wafers

3. Dry etching processing of dielectric thin films

4. Replacement and maintenance of spare parts for semiconductor equipment

5. Power source for vacuum plasma chamber matching

Overall, Lam 660-093818-002 is a mature 2.5kW RF source and a core spare part for repairing and replacing Lam etching equipment

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