LAM 853-143791-912 Spectrometer

LAM 853-143791-912 Spectrometer        

Product Details Introduction

LAM 853-143791-912 Spectrometer

Introduction: LAM 853-143791-912 is a plasma spectral detection module equipped with the Panlin etching machine, which monitors the plasma state inside the cavity in real time and controls the endpoint of the etching process.

High resolution spectroscopic detection, accurately capturing plasma characteristic spectra

Real time collection of light intensity data, automatic determination of etching endpoint stop process

Built in high-precision detector, stable recognition of weak spectral signals

Optical path sealed and dust-proof, suitable for semiconductor dust-free chamber environment

Anti RF interference optical isolation design, not affected by cavity RF

Fast spectral sampling, real-time feedback control system for process fluctuations

Integrated self-test program, automatically verifies optical path and signal upon startup

Compact metal module, installed in situ on the machine without occupying additional space

Standard communication interface, connect to the upper computer of the device to upload process curves

Temperature resistant optical components, the long-term high-temperature performance of the cavity does not deteriorate

Multiple signal fault alarm, quickly locate optical and line abnormalities

Original factory matching LAM series ICP etching equipment, direct installation replacement

Low loss quartz optical path, high spectral transmittance, small detection error

Reinforce internal wiring to withstand continuous vibration of equipment without displacement

Factory plasma linkage calibration ensures reliable consistency in testing

Conclusion: LAM 853-143791-912 has precise and stable detection, accurately controls the etching endpoint, and effectively improves wafer process yield.

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