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DAIHEN 2L39-000158-V3 RF Automatic Matcher
- Goods status： new/used
- Delivery date: stock
- The quality assurance period： 365 days
- Phone/WhatsApp/WeChat：+86 15270269218
- Email：stodcdcs@gmail.com
- Tags：2L39-000158-V3
- Get the latest price：Click to consult
DAIHEN 2L39-000158-V3 RF Automatic Matcher
Product Details Introduction
DAIHEN 2L39-000158-V3 RF Automatic Matcher Product Features
beginning
DAIHEN 2L39-000158-V3 is a dedicated RF matching device for semiconductor etching and coating equipment from Daihara Original Factory. It has fast impedance matching speed, low energy loss, and is compatible with TEL process machines. Its core features are as follows:
High speed automatic impedance adjustment, quickly matching cavity plasma load
Low reflection power design, high RF energy utilization efficiency
Compatible with standard 13.56MHz industrial RF frequency band, with strong process compatibility
Integrated air-cooled heat dissipation, controllable temperature rise during long-term full load operation
Built in overvoltage, overcurrent, and standing wave multiple hardware security protections
Multi channel status indicator lights, matched with visual display of abnormal faults
Industrial communication interface, which can be linked to the host for real-time monitoring and matching of parameters
Metal sealed chassis, dustproof and corrosion-resistant, suitable for clean workshops
Original factory standard RF interface, compatible with DAIHEN RF power supply of the same series
Power off to save matching parameters, restart without recalibration
Standard cabinet embedded size, easy disassembly and replacement operation
Modular internal capacitors and inductors, convenient for troubleshooting and replacement
Partition layout of strong and weak current lines, anti workshop electromagnetic interference
Continuous 24-hour mass production stable operation, good matching repeatability
Original standardized spare parts, interchangeable with 2L39 series models
ending
DAIHEN 2L39-000158-V3 is a stable RF impedance matching accessory for semiconductor plasma processes, with precise matching and complete protection.
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