ADVANCED ENERGY 3151801-004 Remote Plasma Source

ADVANCED ENERGY 3151801-004 Remote Plasma Source 

Product Details Introduction

ADVANCED ENERGY 3151801-004 Remote Plasma Source Product Features

Introduction: ADVANCED ENERGY 3151801-004 is suitable for semiconductor cavity cleaning, with stable and user-friendly performance.

Equipped with a matching network, suitable for various process conditions

High power output, thorough decomposition of cleaning gas

Dual electrode ignition, less likely to fail during startup

Mixed heat dissipation, long-term operation without high temperature

Anti corrosion chamber with low dust production

Accurate power detection and good process consistency

Compatible with multiple process gases, with a wide range of applications

Modular structure, easy maintenance and disassembly

Multiple communication interfaces for easy matching of the entire machine

Less cooling water, saving usage costs

Low electrode loss and longer overall lifespan of the machine

Compact size, can directly replace devices of the same type

Multiple safety protections, automatic shutdown in case of abnormalities

Stable transportation of active particles and uniform cleaning effect

Dustproof and anti-interference, suitable for use in clean workshops

Conclusion: ADVANCED ENERGY 3151801-004 is easy to maintain and runs stably, making it the preferred plasma source for wafer equipment cleaning.

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