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  • Novellus 02-351553-0 Digital Dynamic Controller
  • Novellus 02-351553-0 Digital Dynamic Controller
Novellus 02-351553-0 Digital Dynamic Controller Novellus 02-351553-0 Digital Dynamic Controller

Novellus 02-351553-0 Digital Dynamic Controller

Novellus 02-351553-0 Digital Dynamic Controller        

 Introduction

Novellus 02-351553-0 Digital Dynamic Controller

Introduction: Novellus 02-351553-0 is a specialized digital control board for Nofa Semiconductor thin film deposition equipment, which dynamically regulates the plasma, gas path, and temperature parameters of the cavity to ensure uniform and stable thin film processes.

High speed digital signal processing, real-time dynamic adjustment of various process parameters

Multi channel synchronous acquisition of pressure, temperature, and flow sensor signals

Built in optoelectronic isolation circuit to isolate electromagnetic interference from RF cavities

Multi layer shielding PCB design reduces the impact of plasma clutter

Closed loop PID dynamic control to suppress process parameter fluctuations and drift

Hardware safety interlock, automatic cut-off of process output for overheating and overpressure

Standard rack plug-in card structure, easy disassembly and replacement of cabinets

Original factory exclusive equipment communication protocol, no debugging required for docking the entire machine

Local storage of multiple sets of process formulas, without loss of power-off parameters

Multi channel digital IO output, control valve group, heating, RF unit

The status indicator light intuitively displays the running, alarm, and standby states

Clean grade industrial components, suitable for dust-free wafer workshop environment

0-50 ℃ wide temperature range, supporting 24-hour uninterrupted mass production

Triple hardware protection design for overvoltage, overcurrent, and short circuit

Compatible with Novellus series PVD/CVD thin film deposition machine

Conclusion: Novellus 02-351553-0 is the core dynamic control component of thin film technology, which stably controls the entire coating process and ensures the uniformity of wafer thin film.

Product imag

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