DAIHEN 3Z39-000001-V1 RF Automatic Matcher

DAIHEN 3Z39-000001-V1 RF Automatic Matcher 

Product Details Introduction

DAIHEN 3Z39-000001-V1 RF Automatic Matcher Product Features

DAIHEN 3Z39-000001-V1 is compatible with semiconductor plasma equipment, automatically adjusts RF impedance, and ensures stable power transmission.

Fast automatic impedance matching to reduce RF reflection loss

Adapt to standard 13.56MHz RF operating frequency

High power bearing design, compatible with etching and coating processes

Built in real-time power detection, dynamically adjusting matching parameters

Multiple protections, including super reflection and automatic shutdown protection against overheating

Air cooled cooling structure, not easily overheated when fully loaded for a long time

Industrial communication interface, capable of docking with machine PLC for centralized control

High precision drive tuning capacitor with high matching accuracy

Anti electromagnetic interference circuit, stable operation under complex working conditions in the workshop

Original factory standard rack size, easy disassembly and replacement of cabinets

Vacuum chamber adaptation design, matching continuous and stable output

Power off to save matching parameters, restart without the need for re debugging

Fault code prompt for quick troubleshooting of matching anomalies

Pure copper RF circuit reduces power transmission loss

Supporting DAIHEN RF power supply and TEL semiconductor equipment

DAIHEN 3Z39-000001-V1 RF automatic matching device is a core component of plasma process RF system, ensuring uniform and stable plasma discharge.

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