SCHUMACHER VG600NI evaporator

SCHUMACHER VG600NI evaporator 

Product Details Introduction

SCHUMACHER VG600NI evaporator product features

SCHUMACHER VG600NI is a semiconductor specific precision chemical evaporator, belonging to the VaporGuard series, suitable for thin film deposition processes, with stable and controllable vaporization output.

Temperature control range of 10-60 ℃, high temperature control accuracy, suitable for most liquid precursor materials

Integrated source cup chamber, strong sealing performance, prevents trace medium leakage and contamination of the chamber

Built in high-precision flow sensor, real-time monitoring of vaporization carrier gas flow value

Equipped with an LCD digital display operation panel, the start stop and parameter settings are intuitive and convenient

Multiple safety protections, automatic alarm and shutdown for over temperature, low pressure, and abnormal liquid level

Corrosion resistant high-purity metal chamber, suitable for various corrosive electronic chemicals

Uniform heat conduction structure, with no significant temperature difference across the entire cavity

Supports standard industrial control communication interface and can be integrated with production line PLC for centralized control

Low pulsation vaporization output ensures uniform and consistent film deposition thickness

Quick detachable source cup component, saving time and effort in replacing chemicals, cleaning and maintenance

Integrated pressure stabilization module, output vapor pressure remains stable for a long time

Low loss insulation layer, reducing heat loss and lowering equipment energy consumption

Standardized rack size, can be directly installed into semiconductor machine standard workstations

Anti reflux one-way valve design to prevent damage to internal components caused by process gas backflow

After completing the sealing and vaporization accuracy calibration at the factory, it can be put into use on the machine

The SCHUMACHER VG600NI evaporator is widely used for gas phase supply in coating and photolithography, and is a core equipment for stable gas supply in semiconductor processes.

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