AMAT 0190-10114W Generator

AMAT  0190-10114W Generator 

Product Details Introduction

AMAT 0190-0114W RF Plasma Generator Product Features

Introduction: AMAT 0190-0114W is a dedicated original RF plasma generator for semiconductor etching and thin film deposition equipment, which stably outputs RF energy and ensures wafer process consistency. Its core features are as follows:

The power output is linearly adjustable, with small power fluctuations and stable plasma state

Built in high-precision power closed-loop feedback, real-time correction of output power values

Adapt to standard semiconductor process frequencies and match cavity plasma excitation requirements

Multiple hardware protections, automatic shutdown interlock for over power, standing wave, and over temperature

Equipped with RS485 and device specific bus, it can be connected to the upper control system of the whole machine

Built in multiple sets of process formula storage, one click switching between different process programs

Low harmonic output design to reduce workshop RF electromagnetic interference

Integrated air-cooled cooling structure, controllable temperature rise during long-term full load operation

Built in fault self checking program, error code quickly locates the fault location

Standard cabinet rack size, rail mounted installation, easy disassembly and maintenance

Impedance adaptive matching circuit reduces process debugging and matching time

Industrial dust-proof sealed body, suitable for dust-free semiconductor workshop environment

Soft start output function to avoid instantaneous high voltage impact on chamber components

Original matching AMAT mass production process platform, no additional modification required for adaptation

High precision power acquisition, accurate recording of process energy parameters for each wafer

Conclusion: AMAT 0190-0114W has stable output and complete protection, and is a core RF power supply component for semiconductor thin film and etching processes.

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